產品介紹


.半導體製程高純特殊氣體 (High Purity Gases Processes for Semiconductor Fabrication):

*蝕刻氣體 (Etchant Gases)

以鹵化物及鹵碳化合物為主:

Chlorine (Cl2)Hydrogen Chloride (HCl)Hydrogen Fluoride (HF)Hydrogen Iodide (HI)Hydrogen Bromide (HBr)Boron Trichloride (BCl3)Nitrogen Trifluoride (NF3 )Sulfur Hexafluoride (SF6 )Halocarbon-14 (CF4)Halocarbon- 23 (CHF3)Halocarbon-116 (C2F6)Halocarbon-318 (C4F8)

*離子植入氣體 (Dopant Gases)

含硼 (B)、磷 (P)、砷 (As)III/V族原子之氣體:

Phosphine (PH3)Arsine (AsH3)Diborane (B2H6)Boron Trifluoride (BF3)Boron-11 Trifluoride (B¹¹F3)Boron Tribromide (BBr3)Phosphorus Pentafluoride (PF5)Phosphorus Trifluoride (PF3)Indium Iodide (InI)

*矽族氣體 (Silicon Precursor Gases)

含矽 (Si) (Ge) 之甲乙基烷類:

Silane (SiH4)Disilane (Si2H6)Dichlorosilane (SiH2Cl2, DCS)Trichlorosilane (SiHCl3, TDC)Silicon Tetrachloride (SiCl4)Silicon Tetrafluoride (SiF4)Germane (GeH4)Germane Tetrafluoride (GeF4)

*反應性氣體 (Reactant Gases)

碳系及氮氫、氮氧化物為主:

Carbon Monoxide (CO)Carbon Dioxide (CO2)Nitric Oxide (NO)Nitrous Oxide (N2O)Ammonia (NH3)Propylene (C3H6)Ethylene (C2H4)Acetylene (C2H2 )

*超高純度氣體 (Ultra High Purity Gases)

純度達99.9999%以上之單一高純氣體, 鋼瓶CGA/DISS Valve:

Hydrogen (H2)Helium (He)Nitrogen (N2)Argon (Ar)Oxygen (O2)

*反應室潔淨氣體 (Chamber Clean Gases)

SF6NF3CF4C2F6C3F8C4F8H2/N2

 

.太陽能/LED製程高純氣體與化學品 (High Purity Gases & Chemicals Processes for Solar/LED Fabrication):

*高純度化學品 (High Purity Chemicals)

- Tetraethylorthosilicate (TEOS)

    - Triethoxyarsine (TEOA)

- Trimethylaluminum (TMAl)

- Trimethylboron (TMB) & Mixtures

- Trimethylgallium (TMGa)

- Trimethylindium (TMIn)

- Diethylzinc (DEZn) & Mixtures

- Bis (cyclopentadienyl) Magnesium (Cp2Mg)

    - Indium Chloride (InCl3)

 

*高純度光源稀有氣體 (Lighting Pure Rare Gases)

純度達99.999%以上之 ArgonNeon KryptonXenon

 

.特殊混合氣體 (Specialty Mixtures)

*製程混合氣體 (Process Mixtures):

    - Arsine Mixtures (AsH3 in He, H2, Ar, N2)

    - Diborane Mixtures (B2H6 in He, H2, Ar, N2)

- Germane Mixtures (GeH4 in He, H2, Ar, N2)

- Phosphine Mixtures (PH3 in He, H2, Ar, N2, SiH4)

    - Silane Mixtures (SiH4 in He, H2, Ar, N2)

    - Disilane Mixtures (Si2H6 in He, H2, Ar, N2)

    - Halocarbon-14/Oxygen Mixtures:

      Plasma Etching (4-8%O2/CF4), Plasma Desmearing(20-30%CF4/O2)

- Hydrogen Selenide Mixtures (H2Se in He, H2, Ar, N2)

- Boron Trichloride Mixtures (BCl3 in He, N2)

- Oxygen/Helium(6N) Mixtures (O2/He)

- Hydrogen Mixtures (H2 in N2, Ar)

 

*製程標準氣體 (Process Standards):

依客戶製程需求配製 ppm % 之標準氣體, 一級標準 (Primary Standard)二級標準 (Certified Standard) 及依重量法配製未分析之重量法標準 (Gravimetric Standard) 等規格。


*鹵素激光鐳射混合氣體 (Halogen Excimer Laser Mixtures):

- %Fluorine(F2) in He, Ar, Ne, Kr, Xe

    - %F2+%Ar in He, Ne%F2+%Kr in He, Ne%F2+%Ar+%Ne/He%F2+%Ar+%He/Ne

    - %HCl in He, Ne%HCl+%H2 in He, Ne%HCl+%H2+%Xe/Ne

*鐳射混合氣體 (Laser Gas Mixtures):

 

- Helium-Neon Laser Gas Mixtures: %Ne/He%Ar+%He/Ne

  

   - Ion Laser Gas Mixtures: %Ar/Kr


   - Molecular Laser gas Mixtures:

     %CO2+%N2/He%CO+%CO2+%N2/He%H2+%CO+%CO2+%N2/He

 

*Gas Mixtures for Window Insulation

 

   - %Ar/Kr%O2/Kr%O2+%Kr/Argon%Xe/Kr

 

*Gas Mixtures for Plasma Display Panel

 

   - %Ar/Ne (for CCFL)%Kr/Ne%Xe/He%Xe/Ne

 

.其它類:

   - Methane (CH4)Methanol (CH3OH)1,3-Butadiene (1,3-C4H6)Potassium Hydrate (KOH)

 、Hydrogen Sulfide(H2S)


有關產純度及應用、混合濃度、容器鋼瓶之規格與容量及閥規格,請洽詢業務部,我們將竭誠為您服務。

 

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